Fiberguide Industries, Inc. has been formally recognized by Lawrence Livermore National Laboratory, Livermore, California, for their participation and contributions in the National Ignition Facility (NIF) program
Fiberguide Industries, Inc. ("Fiberguide") has been formally recognized by Lawrence Livermore National Laboratory, Livermore, California, for their participation and contributions in the National Ignition Facility (NIF) program with the presentation of a plaque at the Fiberguide Idaho facility.
The National Ignition Facility, or NIF, is a laser-based inertial confinement fusion (ICF) research device under construction at the Lawrence Livermore National Laboratory, in Livermore, California, United States. NIF uses powerful lasers to heat and compress a small amount of hydrogen fuel to the point where nuclear fusion reactions take place. NIF is the largest and most energetic ICF device built to date, and the first that is expected to reach the long-sought goal of "ignition," when the fusion reactions become self-sustaining.
Getting accurate IR spectra on monolayer of molecules
April 18th 2024Creating uniform and repeatable monolayers is incredibly important for both scientific pursuits as well as the manufacturing of products in semiconductor, biotechnology, and. other industries. However, measuring monolayers and functionalized surfaces directly is. difficult, and many rely on a variety of characterization techniques that when used together can provide some degree of confidence. By combining non-contact atomic force microscopy (AFM) and IR spectroscopy, IR PiFM provides sensitive and accurate analysis of sub-monolayer of molecules without the concern of tip-sample cross contamination. Dr. Sung Park, Molecular Vista, joined Spectroscopy to provide insights on how IR PiFM can acquire IR signature of monolayer films due to its unique implementation.
Deep Level Transient Spectroscopy Reveals Influence of Defects on 2D Semiconductor Devices
April 25th 2024A recent study used deep level transient spectroscopy to investigate the electrical response of defect filling and emission in monolayer metal-organic chemical vapor deposition (MOCVD)-grown materials deposited on complementary metal-oxide-semiconductor (CMOS)-compatible substrates.