Special Issues-08-01-2009

Infrared spectroscopy is a powerful analysis technique used in the semiconductor industry to ensure the quality of silicon and silicon wafers. The authors discuss the use of an inexpensive, lab-based system to measure carbon and oxygen concentrations in silicon to the level of precision required by the solar silicon industry.

The authors illustrate the value of FT-IR–ATR with sample viewing through the analysis of an ink source on paper.

The authors discuss the use of vibrational spectroscopy to differentiate an authentic article from a counterfeit one throughout a product's lifecycle, from component receipt at the site of manufacture, to product receipt by the end user.

Whether used for traditional applications such as identifying counterfeit pharmaceuticals or in some of the more glamorous "CSI-type" forensic applications such as ink analysis, FT-IR technology continues to occupy a large and important space in the field of spectroscopy.

The authors discuss the combined use of Raman and FT-IR spectroscopy in fields such as forensic science, biomedical science, catalysis, and polymers.

Transmission methods are often affected by film thickness and can result in inaccuracies. Polarization measurement using attenuated total reflectance (ATR), a Fourier transform–infrared (FT-IR) technique, is offered as an alternate resource because it is not adversely affected by film thickness.

The authors look at the ways in which an imaging FT-IR microscope system with an integrated linear array detector can aid in the examination of a wide array of samples.

Spectroscopy presents a comprehensive index of our FT-IR articles since 2004.

Click the title above to open the Spectroscopy August 2009 regular issue, Vol 24 No 8, in an interactive PDF format.