|Articles|May 14, 2015
Characterization of SiO2 on Glass by Spectroscopic Ellipsometry
Author(s)Assia Shagaleeva
Measuring thickness and optical constants of transparent films on transparent substrates can be a challenge for spectroscopic ellipsometry. The sensitivity of the HORIBA UVISEL ellipsometer allows this challenging task to be easily performed.
Advertisement
Newsletter
Get essential updates on the latest spectroscopy technologies, regulatory standards, and best practices—subscribe today to Spectroscopy.
Advertisement
Advertisement
Advertisement
Trending on Spectroscopy Online
1
Analyzing Elemental and Stable Metal Isotopic Compositions of Biological Systems
2
An Inside Look at SIBS and Transient Discharges
3
Using Ambient Ionization Techniques to Enable Polymer Characterization
4
Thermo Fisher Expands Handheld XRF Line with New High-End Analyzer for Field Use
5
