Featured products from the spectroscopy industry.
Interactive web tool
Thermo Fisher Scientific has introduced an online tool at www.thermo.com/ftir that allows scientists to create their own custom Nicolet 6700 FT-IR spectrometer for their specific analysis needs. According to the company, visitors to the site can browse sampling accessories, select appropriate software, and add external components, wuch as IR microscopes and Raman. Thermo Fisher Scientific, Waltham, MA;
www.thermo.com
Spectrofluorometer
HORIBA Jobin Yvon's FluoroMax-4 benchtop spectrofluorometer reportedly features a sensitivity of at least 400,000 cps for the water-Raman peak at 397 nm and a signal-to-noiseratio of 3000:1 minimum. According to the company, the spectrofluorometer uses an ozone-free xenon arc lamp for broadband coverage from the UV to near-IR. Optionalaccessories include automatic polarizers, a stopped-flow device for kinetics, a microwellplate reader, and an autotitrator. HORIBA Jobin Yvon, Edison, NJ;
www.jobinyvon.com
Getting accurate IR spectra on monolayer of molecules
April 18th 2024Creating uniform and repeatable monolayers is incredibly important for both scientific pursuits as well as the manufacturing of products in semiconductor, biotechnology, and. other industries. However, measuring monolayers and functionalized surfaces directly is. difficult, and many rely on a variety of characterization techniques that when used together can provide some degree of confidence. By combining non-contact atomic force microscopy (AFM) and IR spectroscopy, IR PiFM provides sensitive and accurate analysis of sub-monolayer of molecules without the concern of tip-sample cross contamination. Dr. Sung Park, Molecular Vista, joined Spectroscopy to provide insights on how IR PiFM can acquire IR signature of monolayer films due to its unique implementation.
Deep Level Transient Spectroscopy Reveals Influence of Defects on 2D Semiconductor Devices
April 25th 2024A recent study used deep level transient spectroscopy to investigate the electrical response of defect filling and emission in monolayer metal-organic chemical vapor deposition (MOCVD)-grown materials deposited on complementary metal-oxide-semiconductor (CMOS)-compatible substrates.