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This study investigates the applicability of a quadrupole-based ICP-MS fitted with a dynamic reaction cell (DRC) to analyze high-purity phosphoric and sulfuric acid used in the semiconductor industry. It compares the DRC approach with traditional ICP-MS background reduction techniques to compensate for phosphorus- and sulfur-based interferences and presents data that suggests that the DRC technology can reach the next generation of semiconductor purity levels for these chemicals.