The Benefits of Dynamic Reaction Cell ICP-MS Technology to Determine Ultratrace Metal Contamination Levels in High-Purity Phosphoric and Sulfuric Acid.pdf

Kawabata,Katsu;Kishi,Yoko;Thomas,Robert;

Article

Spectroscopy

January 1, 2003

Spectroscopy

Spectroscopy-01-01-2003

Volume

The Benefits of Dynamic Reaction Cell ICP-MS Technology to Determine Ultratrace Metal Contamination Levels in High-Purity Phosphoric and Sulfuric Acid.pdf

Author(s):

Katsu Kawabata,Yoko Kishi

This study investigates the applicability of a quadrupole-based ICP-MS fitted with a dynamic reaction cell (DRC) to analyze high-purity phosphoric and sulfuric acid used in the semiconductor industry. It compares the DRC approach with traditional ICP-MS background reduction techniques to compensate for phosphorus- and sulfur-based interferences and presents data that suggests that the DRC technology can reach the next generation of semiconductor purity levels for these chemicals.

To view a PDF of this article from the Spectroscopy Online archives, click this link.

Articles in this issue

Chemometrics in Spectroscopy: Analysis of Noise, Part XIV (PDF)

The Benefits of Dynamic Reaction Cell ICP-MS Technology to Determine Ultratrace Metal Contamination Levels in High-Purity Phosphoric and Sulfuric Acid.pdf

Unique Atomic Spectroscopy Aims at Answering a Universal Question.pdf

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The Benefits of Dynamic Reaction Cell ICP-MS Technology to Determine Ultratrace Metal Contamination Levels in High-Purity Phosphoric and Sulfuric Acid.pdf

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