Yoko Kishi

The authors show that dynamic reaction cell ICP MS can eliminate a number of argon- and carbon-based polyatomic interferences, allowing the determination of many critical elements in problematic organic compounds found in the semiconductor industry.

This study investigates the applicability of a quadrupole-based ICP-MS fitted with a dynamic reaction cell (DRC) to analyze high-purity phosphoric and sulfuric acid used in the semiconductor industry. It compares the DRC approach with traditional ICP-MS background reduction techniques to compensate for phosphorus- and sulfur-based interferences and presents data that suggests that the DRC technology can reach the next generation of semiconductor purity levels for these chemicals.