VUV Analytics in Collaborative Project with Caltech Environmental Analysis Center
VUV Analytics (Cedar Park, Texas) is collaborating with Caltech Environmental Analysis Center (EAC) in Pasadena, California, in a closed-ended project that explores new application capabilities using VUV’s VGA-100 Vacuum Ultraviolet (VUV) detector.
VUV Analytics (Cedar Park, Texas) is collaborating with Caltech Environmental Analysis Center (EAC) in Pasadena, California, in a closed-ended project that explores new application capabilities using VUV’s VGA-100 Vacuum Ultraviolet (VUV) detector. The Caltech EAC is an open-access, user-operated laboratory based in the Environmental Sciences and Engineering Program, with the primary focus on research and analytical methods using mass spectrometry, gas chromatography, liquid chromatography, ion chromatography, and capillary electrophoresis.
Nathan Dalleska, director of the EAC said in a statement, “We are very excited to be partnering with VUV Analytics on this unique collaboration opportunity.” He noted that the research would focus on applying novel VUV absorption spectroscopy methods to identifying compounds and classes of compounds with much greater levels of sensitivity and selectivity compared to other approaches.
Getting accurate IR spectra on monolayer of molecules
April 18th 2024Creating uniform and repeatable monolayers is incredibly important for both scientific pursuits as well as the manufacturing of products in semiconductor, biotechnology, and. other industries. However, measuring monolayers and functionalized surfaces directly is. difficult, and many rely on a variety of characterization techniques that when used together can provide some degree of confidence. By combining non-contact atomic force microscopy (AFM) and IR spectroscopy, IR PiFM provides sensitive and accurate analysis of sub-monolayer of molecules without the concern of tip-sample cross contamination. Dr. Sung Park, Molecular Vista, joined Spectroscopy to provide insights on how IR PiFM can acquire IR signature of monolayer films due to its unique implementation.
