Mark Kelinske


GC-ICP-MS for Process and Quality Control in Semiconductor Manufacturing

September 01, 2023

Manufacturing advanced electronic devices requires the production of high-quality semiconductors and integrated circuit chips. In this article, the authors explain how GC, when coupled with ICP-MS, enables the detection of elements that are essential in semiconductor production.

Rapid Multielement Nanoparticle Analysis Using Single-Particle ICP-MS/MS

May 01, 2019

Complex isobaric and polyatomic spectral interferences can be mitigated using triple quadrupole ICP-MS (ICP-MS/MS) with a collision–reaction cell (CRC). This configuration allows for the multielement characterization and detection of smaller nanoparticle sizes.