
In this Eastern Analytical Symposium (EAS) interview, Garth Simpson of Purdue University explains how a simple geometric effect at interfaces produced a 4.5-degree rotation in fluorescence emission from a naproxen monolayer.
Ultra-high-purity HCl is crucial in semicon wafer cleaning. The NexION® 2200 ICP-MS accurately quantifies ultra-trace impurities, minimizing interferences and sample prep.







