Researchers use minced banana peel to extract lead and copper ions from raw river water.
Researchers from São Paulo State University (Ilha Solteira, Brazil) have used Fourier transform–infrared (FT-IR) spectrometry to examine the use of minced banana peel to extract lead and copper ions from water. Studying a sample of raw river water, the team applied FT-IR to the extraction of Cu(II) and Pb(II), which showed absorption bands of carboxylic and amine groups at 1730 and 889 cm1, respectively, and maximum adsorption capacities of 0.33 and 0.20 mmol g-1 for Cu(II) and Pb(II), respectively.
Led by Gustavo R. Castro of the Department of Crop Science, Food Technology, and Socioeconomics, the team applied the minced banana peel in the preconcentration system, which showed an enrichment factor of approximately 20-fold, and reused the column for 11 cycles without loss in the percentage of recovery. The team published their findings in the March 2011 issue of Industrial & Engineering Chemistry Research.
Getting accurate IR spectra on monolayer of molecules
April 18th 2024Creating uniform and repeatable monolayers is incredibly important for both scientific pursuits as well as the manufacturing of products in semiconductor, biotechnology, and. other industries. However, measuring monolayers and functionalized surfaces directly is. difficult, and many rely on a variety of characterization techniques that when used together can provide some degree of confidence. By combining non-contact atomic force microscopy (AFM) and IR spectroscopy, IR PiFM provides sensitive and accurate analysis of sub-monolayer of molecules without the concern of tip-sample cross contamination. Dr. Sung Park, Molecular Vista, joined Spectroscopy to provide insights on how IR PiFM can acquire IR signature of monolayer films due to its unique implementation.
Deep Level Transient Spectroscopy Reveals Influence of Defects on 2D Semiconductor Devices
April 25th 2024A recent study used deep level transient spectroscopy to investigate the electrical response of defect filling and emission in monolayer metal-organic chemical vapor deposition (MOCVD)-grown materials deposited on complementary metal-oxide-semiconductor (CMOS)-compatible substrates.