New Approaches to XRD Profile Modeling
November 06, 2019
X-ray diffraction (XRD) techniques are often used to understand the nature of stacking of layers that form clay nanocrystals. But there are problems with these techniques that make applications difficult and often ambiguous. Dr. David Bish, Professor Emeritus at Indiana University (Bloomington, Indiana), and former students Dr. Hongji Yuan and Dr. Alberto Leonardi have been exploring ways to streamline and accelerate the process with a new matrix methodology as well as gaining more accurate results through the use of simulated profiles based on very large-scale atomistic models. We spoke to Dr. Bish about his group’s work in these areas and what these improvements can mean for the future of XRD modeling.