MKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, monitor, deliver, analyze, power and control critical parameters of advanced manufacturing processes to improve process performance and productivity. Our products are derived from our core competencies in pressure measurement and control, materials delivery, gas composition analysis, control and information technology, power and reactive gas generation, vacuum technology, photonics, lasers, optics and motion control.
MKS Instruments partners with customers to solve the complex technology challenges affecting their ability to effectively monitor, deliver, analyze, power and control the critical parameters of the advanced processes they manage. Our primary served markets are manufacturers of capital equipment for semiconductors, industrial technologies, life and health sciences, and research and defense.
MKS Instruments offers an unparalleled range of sophisticated instruments, components, subsystems, and software designed to solve today's toughest technology challenges.
MKS Instruments operates in 60+ countries globally.
MKS Instruments, Inc.
2 Tech Drive, Suite 201,
Andover, MA 01810
TELEPHONE
(978) 645-5000
FAX
(978) 557-5100
E-MAILmks@mksinst.com
WEB SITEwww.mksinst.com
NUMBER OF EMPLOYEES
4600
YEAR FOUNDED
1961
Getting accurate IR spectra on monolayer of molecules
April 18th 2024Creating uniform and repeatable monolayers is incredibly important for both scientific pursuits as well as the manufacturing of products in semiconductor, biotechnology, and. other industries. However, measuring monolayers and functionalized surfaces directly is. difficult, and many rely on a variety of characterization techniques that when used together can provide some degree of confidence. By combining non-contact atomic force microscopy (AFM) and IR spectroscopy, IR PiFM provides sensitive and accurate analysis of sub-monolayer of molecules without the concern of tip-sample cross contamination. Dr. Sung Park, Molecular Vista, joined Spectroscopy to provide insights on how IR PiFM can acquire IR signature of monolayer films due to its unique implementation.
Deep Level Transient Spectroscopy Reveals Influence of Defects on 2D Semiconductor Devices
April 25th 2024A recent study used deep level transient spectroscopy to investigate the electrical response of defect filling and emission in monolayer metal-organic chemical vapor deposition (MOCVD)-grown materials deposited on complementary metal-oxide-semiconductor (CMOS)-compatible substrates.