Amptek, Inc., is a recognized world leader in the design and manufacture of state-of-the-art X-ray and gamma ray detectors, preamplifiers, instrumentation, and components for portable instruments, laboratories, satellites, and analytical purposes. These products provide the user with high performance and high reliability together with small size and low power.
X-ray fluorescence (EDXRF), direct spectral measurements, EDS XRF, PIXE, and TXRF.
Amptek serves wherever X-ray detection is used; for example, hand-held and table-top XRF analyzers produced by OEMs; research facilities in universities, commercial enterprises and the military; nuclear medicine; space; museums; environmental monitoring; and geological analysis of soils and minerals.
Amptek recently brought silicon wafer manufacturing in-house and improved the process. The results are detectors with lower noise, lower leakage current, better charge collection, and uniformity from detector to detector.
The FAST SDD® represents Amptek's highest performance silicon drift detector (SDD), capable of count rates over 1,000,000 CPS (counts per second) while maintaining excellent resolution. The FAST SDD® is also available with our Patented C-Series (Si3N4) low energy windows for soft X-ray analysis.
Amptek has developed a 70 mm2 FAST SDD® Detector in a TO-8 package. This is the same package that is used with all Amptek detectors. This makes the 70 mm2 a drop-in replacement (same package, same pin-out, same voltages). Triple the count rate versus the 25 mm2 SDD with the same performance.
Also offering improved performance are Amptek's SDD and Si-PIN detectors.
Amptek detectors are offered in a wide range of configurations with their Preamplifiers and Digital Pulse Processors (DPP) for complete XRF portable solutions.
Amptek, Inc.
14 DeAngelo Drive
Bedford, MA 01730
TELEPHONE
(781) 275-2242
FAX
(781) 275-3470
E-MAIL sales@amptek.com
WEB SITE www.amptek.com
NUMBER OF EMPLOYEES
47
YEAR FOUNDED
1977
Getting accurate IR spectra on monolayer of molecules
April 18th 2024Creating uniform and repeatable monolayers is incredibly important for both scientific pursuits as well as the manufacturing of products in semiconductor, biotechnology, and. other industries. However, measuring monolayers and functionalized surfaces directly is. difficult, and many rely on a variety of characterization techniques that when used together can provide some degree of confidence. By combining non-contact atomic force microscopy (AFM) and IR spectroscopy, IR PiFM provides sensitive and accurate analysis of sub-monolayer of molecules without the concern of tip-sample cross contamination. Dr. Sung Park, Molecular Vista, joined Spectroscopy to provide insights on how IR PiFM can acquire IR signature of monolayer films due to its unique implementation.
Achieving Accurate IR Spectra On Monolayer of Molecules
April 18th 2024Creating uniform and repeatable monolayers is incredibly important for both scientific pursuits as well as the manufacturing of products in semiconductor, biotechnology, and. other industries. However, measuring monolayers and functionalized surfaces directly is. difficult, and many rely on a variety of characterization techniques that when used together can provide some degree of confidence. By combining non-contact atomic force microscopy (AFM) and IR spectroscopy, IR PiFM provides sensitive and accurate analysis of sub-monolayer of molecules without the concern of tip-sample cross contamination. Dr. Sung Park, Molecular Vista, joined Spectroscopy to provide insights on how IR PiFM can acquire IR signature of monolayer films due to its unique implementation.